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Nonpolar InxGa1xN/GaN(11¯00) multiple quantum wells grown on γLiAlO2(100) by plasma-assisted molecular-beam epitaxy

Yue Jun Sun, Oliver Brandt, Sven Cronenberg, Subhabrata Dhar, Holger T. Grahn, Klaus H. Ploog, Patrick Waltereit, and James S. Speck
Phys. Rev. B 67, 041306(R) – Published 30 January 2003; Erratum Phys. Rev. B 69, 129902 (2004)
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Abstract

M-plane In0.1Ga0.9N(11¯00) multiple quantum wells were grown on γLiAlO2(100) by plasma-assisted molecular-beam epitaxy. The high brightness of the photoluminescence of these multiple quantum wells and the observation of band-edge emission from the barriers are consistent with the expected absence of spontaneous and piezoelectric polarization fields along the growth direction. Despite this fact, the recombination dynamics observed is rather complex and is shown to originate from the superposition of exciton relaxation towards a band of localized states and simultaneous recombination.

  • Received 9 September 2002

DOI:https://doi.org/10.1103/PhysRevB.67.041306

©2003 American Physical Society

Erratum

Erratum: Nonpolar InxGa1xN/GaN(11¯00) multiple quantum wells grown on γLiAlO2(100) by plasma-assisted molecular-beam epitaxy [Phys. Rev. B 67, 041306(R) (2003)]

Yue Jun Sun, Oliver Brandt, Sven Cronenberg, Subhabrata Dhar, Holger T. Grahn, Klaus H. Ploog, Patrick Waltereit, and James S. Speck
Phys. Rev. B 69, 129902 (2004)

Authors & Affiliations

Yue Jun Sun*, Oliver Brandt, Sven Cronenberg, Subhabrata Dhar, Holger T. Grahn, and Klaus H. Ploog

  • Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, D-10117 Berlin, Germany

Patrick Waltereit and James S. Speck

  • Materials Department, University of California, Santa Barbara, California 93106

  • *Electronic address: yjsun@pdi-berlin.de

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Vol. 67, Iss. 4 — 15 January 2003

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