Comment on “Boson peak in amorphous silicon: A numerical study”

S. M. Nakhmanson, D. A. Drabold, and N. Mousseau
Phys. Rev. B 66, 087201 – Published 5 August 2002
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Abstract

Based on molecular-dynamics simulations using the Stillinger-Weber interatomic potential, Finkemeier and von Niessen recently proposed that the presence of the Boson peak in aSi can be attributed to coordination defects [F. Finkemeier and W. von Niessen, Phys. Rev. B 63, 235204 (2001)] and claimed agreement with earlier simulation results for models of aSi with voids [S. M. Nakhmanson and D. A. Drabold, Phys. Rev. B 61, 5376 (2000)]. In this Comment, we clarify this issue and suggest that (i) the atomistic models of Finkemeier and von Niessen do not represent realistic amorphous silicon and (ii) the results for the models with voids do not support the hypothesis that coordination defects are the main cause of the appearance of the Boson peak in this material.

  • Received 23 July 2001

DOI:https://doi.org/10.1103/PhysRevB.66.087201

©2002 American Physical Society

Authors & Affiliations

S. M. Nakhmanson*

  • Department of Physics, North Carolina State University, Raleigh, North Carolina 27695

D. A. Drabold

  • Department of Physics and Astronomy, Condensed Matter and Surface Science Program, Ohio University, Athens, Ohio 45701

N. Mousseau

  • Département de physique et Groupe de recherche en science et technologie des couches minces, Université de Montréal, C.P. 6128, Succursale centre-ville, Montréal (Québec) Canada H3C 3J7

  • *Electronic address: nakhmans@nemo.physics.ncsu.edu; URL: http://nemo.physics.ncsu.edu/̃nakhmans/
  • Electronic mail: drabold@ohio.edu
  • Electronic address: Normand.Mousseau@UMontreal.ca

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Vol. 66, Iss. 8 — 15 August 2002

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