Origin of p-type doping difficulty in ZnO: The impurity perspective

C. H. Park, S. B. Zhang, and Su-Huai Wei
Phys. Rev. B 66, 073202 – Published 5 August 2002
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Abstract

We investigate the p-type doping difficulty in ZnO by first-principles total-energy calculations. The dopants being considered are group-I elements Li, Na, and K and group-V elements N, P, and As. We find that substitutional group-I elements are shallow acceptors, while substitutional group-V elements such as P and As are deep acceptors. The AX centers that convert acceptors into deep donors are found to be unstable except for P and As. Without compensation by intrinsic defects, the most likely cause for doping difficulty is the formation of interstitials for group-I elements and antisites for group-V elements. Among all the dopants studied here, N is a relatively better candidate for p-type ZnO.

  • Received 27 November 2001

DOI:https://doi.org/10.1103/PhysRevB.66.073202

©2002 American Physical Society

Authors & Affiliations

C. H. Park1,2, S. B. Zhang1, and Su-Huai Wei1

  • 1National Renewable Energy Laboratory, Golden, Colorado 80401
  • 2Research Center for Dielectric and Advanced Matter Physics, Pusan National University, Pusan 609-735, Korea

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Vol. 66, Iss. 7 — 15 August 2002

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