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Modification of surface-state dispersion upon Xe adsorption: A scanning tunneling microscope study

Ji-Yong Park, U. D. Ham, S.-J. Kahng, Y. Kuk, K. Miyake, K. Hata, and H. Shigekawa
Phys. Rev. B 62, R16341(R) – Published 15 December 2000
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Abstract

The modification of the surface electronic structure by an adsorbate is measured quantitatively with scanning tunneling microscopy and spectroscopy for the first time. The standing wave of the Cu surface-state electrons is utilized to probe the subtle change in the electronic structure on the Xe-covered Cu(111). The observed Fermi wavelength on the Xe-covered surface is longer by 15% than on the bare Cu surface. The change upon Xe adsorption is explained with the observed modified dispersion of the Cu surface state; upward shift by (130±20)meV with almost same effective mass.

  • Received 24 October 2000

DOI:https://doi.org/10.1103/PhysRevB.62.R16341

©2000 American Physical Society

Authors & Affiliations

Ji-Yong Park, U. D. Ham, S.-J. Kahng, and Y. Kuk*

  • Department of Physics and Center for Science in Nanometer Scale, Seoul National University, Seoul, 151-742, Korea

K. Miyake1, K. Hata1, and H. Shigekawa1,2

  • 1Institute of Applied Physics and CREST, Japan Science and Technology Corporation (JST), University of Tsukuba, Tsukuba, 305-8573, Japan
  • 2Department of Chemistry and Biotechnology, Graduate School of Engineering, The University of Tokyo, Hongo, Tokyo, 113-8656, Japan

  • *To whom correspondence should be addressed; Electronic address: ykuk@phya.snu.ac.kr

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Vol. 62, Iss. 24 — 15 December 2000

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