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Low-density framework form of crystalline silicon with a wide optical band gap

Jan Gryko, Paul F. McMillan, Robert F. Marzke, Ganesh K. Ramachandran, Derek Patton, Sudip K. Deb, and Otto F. Sankey
Phys. Rev. B 62, R7707(R) – Published 15 September 2000
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Abstract

Synthesis of a guest-free clathrate form of crystalline silicon was achieved by successive vacuum treatment and density separation of NaxSi136-based materials. The new allotrope of silicon has an open framework structure based upon slightly distorted tetrahedral atoms bound into five- and six-membered ring structures, and corresponds to a fully saturated and condensed fullerane-type solid. Theoretical calculations indicate that the new form of silicon should be a wide bandgap semiconductor. This prediction is borne out by experiment: electrical conductivity and optical absorption measurements yield a band gap of 1.9 eV, approximately twice the value of “normal” semiconducting silicon.

  • Received 26 May 2000

DOI:https://doi.org/10.1103/PhysRevB.62.R7707

©2000 American Physical Society

Authors & Affiliations

Jan Gryko1,2,*, Paul F. McMillan2,3,†, Robert F. Marzke4, Ganesh K. Ramachandran3, Derek Patton1, Sudip K. Deb2, and Otto F. Sankey4

  • 1Department of Physical and Earth Sciences, Jacksonville State University, Jacksonville, Alabama 36265
  • 2Center for Solid State Science, Arizona State University, Tempe, Arizona 85287-1704
  • 3Department of Chemistry and Biochemistry, Arizona State University, Tempe, Arizona 85287-1604
  • 4Department of Physics and Astronomy, Arizona State University, Tempe, Arizona 85287-1504

  • *Author to whom correspondence should be addressed. Email: gryko@jsucc.jsu.edu
  • Email: pmcmillan@asu.edu

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Vol. 62, Iss. 12 — 15 September 2000

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