Method for tight-binding parametrization: Application to silicon nanostructures

Y. M. Niquet, C. Delerue, G. Allan, and M. Lannoo
Phys. Rev. B 62, 5109 – Published 15 August 2000
PDFExport Citation

Abstract

We propose a method for tight-binding parametrization, designed to give accurate results in the calculation of confined edge states in semiconductor nanostructures of any size. Indeed, this improved tight-binding description accurately reproduces the bulk effective masses as well as the overall band structure. We apply it to the specific case of silicon. The electronic states of silicon nanostructures (films, wires, and dots), with various shapes and orientations, are calculated over large range of sizes (1–12 nm), including spin orbit. Accurate analytical laws for the confinement energies, valid over the whole range of sizes, are derived. Consistent comparison with the effective mass and kp methods show that these are only of semiquantitative value even for sizes as large as 8 nm. The reasons for the failure of these techniques is analyzed in detail.

  • Received 18 February 2000

DOI:https://doi.org/10.1103/PhysRevB.62.5109

©2000 American Physical Society

Authors & Affiliations

Y. M. Niquet*, C. Delerue, G. Allan, and M. Lannoo

  • Institut d’Electronique et de Microélectronique du Nord, Département ISEN, Boîte Postale 69, F-59652 Villeneuve d’Ascq Cedex, France

  • *Corresponding author: Y. M. Niquet. E-mail: ymn@isen.iemn.univ-lille1.fr FAX: (33) 3 20 19 78 84.

References (Subscription Required)

Click to Expand
Issue

Vol. 62, Iss. 8 — 15 August 2000

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×