Heat-treatment effect on the nanosized graphite π-electron system during diamond to graphite conversion

B. L. V. Prasad, Hirohiko Sato, Toshiaki Enoki, Yoshihiro Hishiyama, Yutaka Kaburagi, A. M. Rao, P. C. Eklund, Kyoichi Oshida, and Morinobu Endo
Phys. Rev. B 62, 11209 – Published 15 October 2000
PDFExport Citation

Abstract

Graphite nanoparticles were prepared by the heat treatment of diamond nanoparticles in the range 900–1600 °C. X-ray diffraction, transmission electron microscopy (TEM) and Raman scattering studies indicate that the onset temperature of the diamond-graphite transition is around 1200 °C and the complete conversion of diamond to graphite occurs at 1600 °C. Based on the structural characteristics the samples are categorized into sp3-dominated (as-prepared and 900 °C), sp2:sp3 mixed-phase (1200 and 1400 °C), and sp2-dominated systems (1600 °C). The larger c-axis repeat distances and the high-resolution TEM images for the sp2:sp3 mixed-phase systems denote the presence of the remnant buckling feature of the diamond (111) planes in the graphene sheets. Magnetic susceptibility and ESR studies suggest the development of itinerant-π-electron system from the 1200 °C and higher-temperature heat-treated samples. The completely graphitized sample reveals the important role of edge-inherited nonbonding π-electron states in the electronic structure. The Raman G-peak position and the orbital diamagnetism show considerable deviation from the bulk-graphite values, which is explained on the basis of charge transfer from the graphite π band to the localized edge states and the resulting shifting of the Fermi level. The enhanced spin-lattice relaxation rates in the case of more graphitized samples heat-treated at 1400 and 1600 °C are expected to arise from the involvement of the localized edge-state electrons. In the less-graphitized 1200 °C heat-treated sample, however, the corrugated nature of the graphene planes is likely to hinder such fast-relaxation processes.

  • Received 10 April 2000

DOI:https://doi.org/10.1103/PhysRevB.62.11209

©2000 American Physical Society

Authors & Affiliations

B. L. V. Prasad, Hirohiko Sato, and Toshiaki Enoki*

  • Department of Chemistry, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8551, Japan

Yoshihiro Hishiyama and Yutaka Kaburagi

  • Faculty of Engineering, Musashi Institute of Technology, 1-28-1, Tamazutsumi, Setagaya-ku, Tokyo 158-8557, Japan

A. M. Rao and P. C. Eklund

  • Department of Physics and Astronomy and Center for Applied Energy Research, University of Kentucky, Lexington, Kentucky 40506

Kyoichi Oshida

  • Nagano National College of Technology, 716 Tokuma, Nagano 381-8550, Japan

Morinobu Endo

  • Department of Electrical Engineering, Shinshu University, Nagano 380-8553, Japan

  • *Author to whom correspondence should be addressed. Email: tenoki@chem.titech.ac.jp, Fax: +81-3-5734-2242.
  • Present address: Department of Physics, Pennsylvania State University, 104 Davey Lab, University Park, PA 16802-6300.

References (Subscription Required)

Click to Expand
Issue

Vol. 62, Iss. 16 — 15 October 2000

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×