Two-dimensional weak-localization effect in the stage-4 ${\mathrm{MoCl}}_5$ graphite intercalation compound

The c-axis resistivity ${\rho }_c\mathrm{}(H,T)\mathrm{}$ of a stage-4 ${\mathrm{MoCl}}_5$ graphite intercalation compound between 1.9 and 50 K has been measured with and without an external magnetic field along the c axis $(0\mathrm{}<~H<~44\mathrm{kOe}).\mathrm{}$ The interior graphite (G) layers form a bottleneck to the c-axis conduction. The T and H dependences of ${\rho }_c$ are mainly determined from that of the bottleneck resistivity which is proportional to the in-plane resistivity of interior graphite layers. An observed logarithmic behavior of ${\rho }_c$ in the form of $\ln \mathrm{}\left(T\right)\mathrm{}$ and $\ln \mathrm{}\left(H\right)\mathrm{}$ indicates that the two-dimensional weak localization occurs in the interior G layers. The T and H dependences of the in-plane conductivity derived from ${\rho }_c$ are well described by a scaling function of $H{\tau }_{\varepsilon }$ at low T and low H, where ${\tau }_{\varepsilon }$ is the characteristic relaxation time for inelastic scattering and is dependent on $T\left({\tau }_{\varepsilon }\approx T^{-0.2}\right).\mathrm{}$