Excitation intensity dependence of photoluminescence from narrow 〈100〉- and 〈111〉A-grown InxGa1xAs/GaAs single quantum wells

T. Sauncy, M. Holtz, O. Brafman, D. Fekete, and Y. Finkelstein
Phys. Rev. B 59, 5049 – Published 15 February 1999
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Abstract

We have used excitation intensity-dependent photoluminescence (PL) spectroscopy to study strained InxGa1xAs/GaAs (x0.23) single quantum wells grown along the 〈001〉 and 111A directions. PL intensities from these two quantum-well samples exhibit a linear dependence on incident power density over the excitation intensity range examined. The linewidth of the emission from the 〈100〉 well is well described by band-filling effects as Iexc is increased. By careful analysis of the excitation intensity dependence of the 〈111〉 linewidth and the corresponding blueshift of the PL peak energy, the strain-induced piezoelectric field is estimated to be 70 kV/cm.

  • Received 20 April 1998

DOI:https://doi.org/10.1103/PhysRevB.59.5049

©1999 American Physical Society

Authors & Affiliations

T. Sauncy and M. Holtz

  • Department of Physics, Texas Tech University, Lubbock, Texas 79409

O. Brafman*, D. Fekete, and Y. Finkelstein

  • Technion Israel Institute of Technology, Haifa, Israel

  • *Deceased.

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Vol. 59, Iss. 7 — 15 February 1999

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