Comparison of cooling rates for hot carriers in GaAs/AlAs quantum wells based on macroscopic and microscopic phonon models

Jian-zhong Zhang, Bang-fen Zhu, and Kun Huang
Phys. Rev. B 59, 13184 – Published 15 May 1999
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Abstract

By using three analytical phonon models in quantum wells—the slab model, the guided-mode model, and the improved version of the Huang-Zhu model [Phys. Rev. B 38, 13 377 (1998)], —and the phonon modes in bulk, the energy-loss rates of hot carriers due to the Fröhlich potential scattering in GaAs/AlAs multiple quantum wells (MQW’s) are calculated and compared to those obtained based on a microscopic dipole superlattice model. In the study, a special emphasis is put on the effects of the phonon models on the hot-carrier relaxation process when taking the hot-phonon effect into account. Our numerical results show that, the calculated energy-loss rates based on the slab model and on the improved Huang-Zhu model are almost the same when ignoring the hot-phonon effect; however, with the hot phonon effect considered, the calculated cooling rate as well as the hot phonon occupation number do depend upon the phonon models to be adopted. Out of the four analytical phonon models investigated, the improved Huang-Zhu model gives the results most close to the microscopic calculation, while the guided-mode model presents the poorest results. For hot electrons with a sheet density around 1012/cm2, the slab model has been found to overestimate the hot-phonon effect by more than 40% compared to the Huang-Zhu model, and about 75% compared to the microscopic calculation in which the phonon dispersion is fully included. Our calculation also indicates that Nash’s improved version [J. Lumin. 44, 315 (1989)] is necessary for evaluating the energy-loss rates in quantum wells of wider well width, because Huang-Zhu’s original analytical formulas are only approximately orthogonal for optical phonons associated with small in-plane wave numbers.

  • Received 7 October 1998

DOI:https://doi.org/10.1103/PhysRevB.59.13184

©1999 American Physical Society

Authors & Affiliations

Jian-zhong Zhang*

  • National Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People’s Republic of China

Bang-fen Zhu

  • National Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People’s Republic of China
  • Center for Advanced Study, Tsinghua University, Beijing 100084, People’s Republic of China

Kun Huang

  • National Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People’s Republic of China

  • *Present address: State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences. P.O. Box 603, Beijing 100080, P.R. China.

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Vol. 59, Iss. 20 — 15 May 1999

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