Spin exchange between a quantum well and the donor layer in Si/Si1xCx

H.-J. Kümmerer, K. Hüftle, C. Weinzierl, G. Denninger, N. Nestle, and K. Eberl
Phys. Rev. B 59, 12568 – Published 15 May 1999
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Abstract

Electron-spin-resonance (ESR) data from modulation-doped Si/Si1xCx heterostructures are reported. The experiments at high ESR frequency (94 GHz) and corresponding high magnetic field (3.5 T) enabled us to separate the ESR of the conduction electrons in the quantum well from the ESR of the phosphorous donors in the doping layer. At temperatures above 20 K a thermally activated electron-exchange process between the quantum well and the donor layer is observed. The effective activation energy of this process is 19 meV. The g factors of the conduction electrons and of the P donors were determined with high absolute accuracy.

  • Received 15 December 1998

DOI:https://doi.org/10.1103/PhysRevB.59.12568

©1999 American Physical Society

Authors & Affiliations

H.-J. Kümmerer, K. Hüftle, C. Weinzierl, and G. Denninger*

  • 2. Physikalisches Institut, Universität Stuttgart, Pfaffenwaldring 57, D-70550 Stuttgart, Germany

N. Nestle

  • Universität Ulm, Sektion NMR, D-89069 Ulm, Germany

K. Eberl

  • MPI für Festkörperforschung, Heisenbergstrasse 1, D-70569 Stuttgart, Germany

  • *Author to whom correspondence should be addressed.

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Issue

Vol. 59, Iss. 19 — 15 May 1999

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