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Composition of InAs quantum dots on GaAs(001): Direct evidence for (In,Ga)As alloying

P. B. Joyce, T. J. Krzyzewski, G. R. Bell, B. A. Joyce, and T. S. Jones
Phys. Rev. B 58, R15981(R) – Published 15 December 1998
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Abstract

Scanning tunneling microscopy has been used to study the growth by molecular beam epitaxy of InAs quantum dots (QD’s) on GaAs(001), with specific emphasis on measuring the volume of the dots at different temperatures as a function of InAs deposition. At low temperatures (∼350 °C), the total QD volume is consistent with a classic Stranski-Krastanov mechanism since it is equal to the additional amount of InAs deposited after the two-dimensional (2D)→3D growth mode transition. By contrast, high substrate temperatures (>420 °C) result in QD’s with a much greater volume, and the implication is that significant mass transport occurs to the dots from both the wetting layer and the substrate. The dots must contain both In and Ga and therefore the description of InAs/GaAs(001) QD formation as a classical Stranski-Krastanov growth process is incorrect.

  • Received 17 August 1998

DOI:https://doi.org/10.1103/PhysRevB.58.R15981

©1998 American Physical Society

Authors & Affiliations

P. B. Joyce and T. J. Krzyzewski

  • Semiconductor Materials IRC and Department of Chemistry, Imperial College, London SW7 2AY, United Kingdom

G. R. Bell and B. A. Joyce

  • Semiconductor Materials IRC, Imperial College, London SW7 2AB, United Kingdom

T. S. Jones*

  • Semiconductor Materials IRC and Department of Chemistry, Imperial College, London SW7 2AY, United Kingdom

  • *FAX: ++44(0)171 594 5801. Electronic address: t.jones@ic.ac.uk

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Vol. 58, Iss. 24 — 15 December 1998

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