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Pressure dependence of optical transitions in In0.15Ga0.85N/GaN multiple quantum wells

W. Shan, J. W. Ager, III, and, W. Walukiewicz, E. E. Haller, M. D. McCluskey, N. M. Johnson, and D. P. Bour
Phys. Rev. B 58, R10191(R) – Published 15 October 1998
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Abstract

The effects of hydrostatic pressure on optical transitions in In0.15Ga0.85N/GaN multiple quantum wells (MQW’s) have been studied. The optical transition associated with confined electron and hole states in the MQW’s was found to shift linearly to higher energy with pressure but exhibit a significantly weaker pressure dependence compared to bulklike thick epitaxial-layer samples. Similar pressure coefficients obtained by both photomodulation and photoluminescence measurements rule out the possibility of the transition involving localized states deep in the band gap. We found that the difference in the compressibility of InxGa1xN and GaN induces a tensile strain in the compressively strained InxGa1xN well layers, partially compensating the externally applied hydrostatic pressure. This mechanical effect is primarily responsible for the smaller pressure dependence of the optical transitions in the InxGa1xN/GaN MQW’s. In addition, the pressure-dependent measurements allow us to identify a spectral feature observed at an energy below the GaN band gap. We conclude that this feature is due to transitions from ionized Mg acceptor states to the conduction band in the p-type GaN cladding layer rather than a confined transition in the MQW’s.

  • Received 26 June 1998

DOI:https://doi.org/10.1103/PhysRevB.58.R10191

©1998 American Physical Society

Authors & Affiliations

W. Shan, J. W. Ager, III, and, and W. Walukiewicz

  • Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720

E. E. Haller

  • Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720
  • Department of Materials Sciences and Mineral Engineering, University of California, Berkeley, California 94720

M. D. McCluskey, N. M. Johnson, and D. P. Bour

  • Xerox Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto, California 94304

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Vol. 58, Iss. 16 — 15 October 1998

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