Localized-state band induced by B δ-doping in Si/Si1xGex/Si quantum wells

K. Schmalz, I. N. Yassievich, K. L. Wang, and S. G. Thomas
Phys. Rev. B 57, 6579 – Published 15 March 1998
PDFExport Citation

Abstract

The density of states of the two-dimensional hole band in B δ-doped Si/Si1xGex/Si quantum wells was obtained using space-charge spectroscopy. Si/Si0.75Ge0.25/Si structures studied have a (25)×1011cm2 concentration of B δ doping in the middle of the quantum well. We have observed the effect of localization for small concentrations of confined holes. The activation energy for the hole emission rate increases as the concentration of confined holes decreases. This allows one to estimate the density of states for the tail of the two-dimensional acceptor band.

  • Received 16 September 1996

DOI:https://doi.org/10.1103/PhysRevB.57.6579

©1998 American Physical Society

Authors & Affiliations

K. Schmalz

  • Institute for Semiconductor Physics, Walter-Korsing-Strasse 2, 15230 Frankfurt (Oder), Germany

I. N. Yassievich

  • Ioffe Physico-Technical Institute, 26 Polytechnicheskaya, 194021 St. Petersburg, Russia

K. L. Wang and S. G. Thomas

  • UCLA Electric Engineering Department, University of California, 66-147 Engineering IV, 405 Hilgard Avenue, Los Angeles, California 90095-1594

References (Subscription Required)

Click to Expand
Issue

Vol. 57, Iss. 11 — 15 March 1998

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×