Andreev reflection in the fractional quantum Hall effect

Nancy P. Sandler, Claudio de C. Chamon, and Eduardo Fradkin
Phys. Rev. B 57, 12324 – Published 15 May 1998
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Abstract

We study the reflection of electrons and quasiparticles on point-contact interfaces between fractional quantum Hall (FQH) states and normal metals (leads), as well as interfaces between two FQH states with mismatched filling fractions. We classify the processes taking place at the interface in the strong-coupling limit. In this regime a set of quasiparticles can decay into quasiholes on the FQH side and charge excitations on the other side of the junction. This process is analogous to an Andreev reflection in normal-metal/superconductor (NS) interfaces.

  • Received 20 November 1997

DOI:https://doi.org/10.1103/PhysRevB.57.12324

©1998 American Physical Society

Authors & Affiliations

Nancy P. Sandler, Claudio de C. Chamon, and Eduardo Fradkin

  • Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801-3080

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Issue

Vol. 57, Iss. 19 — 15 May 1998

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