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Metal-insulator transition at B=0 in p-type SiGe

P. T. Coleridge, R. L. Williams, Y. Feng, and P. Zawadzki
Phys. Rev. B 56, R12764(R) – Published 15 November 1997
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Abstract

Observations are reported of a metal-insulator transition in a two-dimensional hole gas in asymmetrically doped strained SiGe quantum wells. The metallic phase, which appears at low temperatures in these high-mobility samples, is characterized by a resistivity that decreases exponentially with decreasing temperature. This behavior, and the duality between resistivity and conductivity on the two sides of the transition are very similar to that recently reported for high-mobility Si metal-oxide-semiconductor field-effect transistors.

  • Received 7 July 1997

DOI:https://doi.org/10.1103/PhysRevB.56.R12764

©1997 American Physical Society

Authors & Affiliations

P. T. Coleridge, R. L. Williams, Y. Feng, and P. Zawadzki

  • Institute for Microstructural Sciences, National Research Council, Ottawa, Ontario, K1A OR6, Canada

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Vol. 56, Iss. 20 — 15 November 1997

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