• Rapid Communication

Influence of the inhomogeneous strain relaxation on the optical properties of etched quantum wires

Y. M. Niquet, C. Priester, and H. Mariette
Phys. Rev. B 55, R7387(R) – Published 15 March 1997
PDFExport Citation

Abstract

Inhomogeneous strain relaxation in quantum wires etched from biaxially strained quantum wells is calculated. Characteristic features of the strain field are systematically discussed as a function of wire dimensions and illustrated with various semiconductor systems either under compressive or tensile strain. We provide a general relaxation curve. The shift of the band-gap energy in nanostructures due to the calculated strain field is then predicted and compared to data obtained from optical spectroscopy experiments.

  • Received 13 September 1996

DOI:https://doi.org/10.1103/PhysRevB.55.R7387

©1997 American Physical Society

Authors & Affiliations

Y. M. Niquet

  • CEA-CNRS Joint Group ``Microstructures de Semiconducteurs II–VI,'' Laboratoire de Spectrométrie Physique,
  • and Institut d'Electronique et de Microélectronique du Nord, Département ISEN, Boîte Postale 69,

C. Priester

  • Institut d'Electronique et de Microélectronique du Nord, Département ISEN, Boîte Postale 69, F-59652 Villeneuve d'Ascq Cedex, France

H. Mariette

  • CEA-CNRS Joint Group ``Microstructures de Semiconducteurs II–VI,'' Laboratoire de Spectrométrie Physique, UniversitéJ. Fourier, Grenoble I, Boîte Postale 87, 38402 Saint Martin d'H`eres, France

References (Subscription Required)

Click to Expand
Issue

Vol. 55, Iss. 12 — 15 March 1997

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×