Effect of well thickness on the two-dimensional electron-hole system in AlxGa1xSb/InAs quantum wells

Ikai Lo, Jih-Chen Chiang, Shiow-Fon Tsay, W. C. Mitchel, M. Ahoujja, R. Kaspi, S. Elhamri, and R. S. Newrock
Phys. Rev. B 55, 13677 – Published 15 May 1997
PDFExport Citation

Abstract

We have studied the effect of well thickness on the two-dimensional electron-hole system in semimetallic AlxGa1xSb/InAs quantum wells by Shubnikov–de Haas (SdH) measurements. The number of hole carriers in the AlxGa1xSb barriers was changed by a negative persistent photoconductivity effect. From the amplitude of SdH oscillation for the sample with the thinnest well, we found that the interface roughness scattering dominated when the number of hole carriers is small. After the number of holes is increased by the negative persistent photoconductivity effect, the electron-hole scattering becomes more important, and results in a reduction of the electron quantum lifetime. The competition between electron-hole scattering and interface roughness scattering depends on the amount of holes in the barriers.

    DOI:https://doi.org/10.1103/PhysRevB.55.13677

    ©1997 American Physical Society

    Authors & Affiliations

    Ikai Lo, Jih-Chen Chiang, and Shiow-Fon Tsay

    • Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan, Republic of China

    W. C. Mitchel, M. Ahoujja, and R. Kaspi

    • Wright Laboratory, Wright-Patterson Air Force Base, Ohio 45433

    S. Elhamri and R. S. Newrock

    • Department of Physics, University of Cincinnati, Cincinnati, Ohio 45221

    References (Subscription Required)

    Click to Expand
    Issue

    Vol. 55, Iss. 20 — 15 May 1997

    Reuse & Permissions
    Access Options
    Author publication services for translation and copyediting assistance advertisement

    Authorization Required


    ×
    ×

    Images

    ×

    Sign up to receive regular email alerts from Physical Review B

    Log In

    Cancel
    ×

    Search


    Article Lookup

    Paste a citation or DOI

    Enter a citation
    ×