Abstract
Lifetimes of electrons in the and image states on Cu(111) are studied with femtosecond time-resolved photoemission. Adsorption of one monolayer of Xe results in a pronounced increase of the image-state lifetime, which for the state changes from 18±5 fs at clean Cu(111) to 75±15 fs at the Xe-covered surface. The slower relaxation rate induced by the Xe layer is attributed to a reduced overlap of the image-state wave function with bulk states. A density-matrix calculation reveals the importance of dephasing in the excitation process.
- Received 5 June 1996
DOI:https://doi.org/10.1103/PhysRevB.54.R5295
©1996 American Physical Society