Abstract
The ion-beam (2 keV Ar) -induced amorphization of thin fullerene films has been studied by in situ electron-energy-loss spectroscopy (EELS). With due care to the electron-beam current, the EELS spectrum may be measured without degradation during the electron bombardment to provide an EELS fingerprint of films. The diminution of the intensity of characteristic peaks in the EELS spectrum upon ion impact was used to deduce a cross section for the destruction of the molecules of (0.85±0.2)× . This value corresponds closely to the geometric size of one molecule, suggesting that each incident Ar ion destroys one molecule upon ion impact. This cross section is somewhat smaller than that expected using scaling arguments from the results of more energetic ion bombardment (100-300 keV). The difference may be due to surface processes, which become important for low-energy ion-beam irradiation.
- Received 22 March 1995
DOI:https://doi.org/10.1103/PhysRevB.53.1573
©1996 American Physical Society