Ion-beam-induced modification of fullerene films as studied by electron-energy-loss spectroscopy

A. Hoffman, P. J. K. Paterson, S. T. Johnston, and S. Prawer
Phys. Rev. B 53, 1573 – Published 15 January 1996
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Abstract

The ion-beam (2 keV Ar) -induced amorphization of thin fullerene films has been studied by in situ electron-energy-loss spectroscopy (EELS). With due care to the electron-beam current, the EELS spectrum may be measured without degradation during the electron bombardment to provide an EELS fingerprint of C60 films. The diminution of the intensity of characteristic peaks in the EELS spectrum upon ion impact was used to deduce a cross section for the destruction of the C60 molecules of (0.85±0.2)×1014 cm2. This value corresponds closely to the geometric size of one C60 molecule, suggesting that each incident Ar ion destroys one C60 molecule upon ion impact. This cross section is somewhat smaller than that expected using scaling arguments from the results of more energetic ion bombardment (100-300 keV). The difference may be due to surface processes, which become important for low-energy ion-beam irradiation.

  • Received 22 March 1995

DOI:https://doi.org/10.1103/PhysRevB.53.1573

©1996 American Physical Society

Authors & Affiliations

A. Hoffman

  • Chemistry Department and Solid State Institute, Technion, Haifa 32000, Israel

P. J. K. Paterson and S. T. Johnston

  • Department of Applied Physics, Royal Melbourne Institute of Technology, 124 Latrobe Street, Melbourne 3001, Australia

S. Prawer

  • School of Physics, University of Melbourne, Parkville, Victoria 3052, Australia

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Vol. 53, Iss. 3 — 15 January 1996

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