Ab initio study of hydrogen adsorption on the Si(111)-(7×7) surface

H. Lim, K. Cho, I. Park, J. D. Joannopoulos, and Efthimios Kaxiras
Phys. Rev. B 52, 17231 – Published 15 December 1995; Erratum Phys. Rev. B 54, 5179 (1996)
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Abstract

First-principles total-energy pseudopotential calculations are performed to investigate the adsorption interaction of a H atom with dangling bonds on the Si(111)-(7×7) surface. The binding energies for adsorption of H at the adatom, rest atom, and corner hole sites are calculated to be 2.9, 3.2, and 3.5 eV, respectively. Spectral analysis of the electronic states shows that nonlocal changes of chemical reactivity are induced by charge transfer upon H adsorption. It is found that H adsorption on the adatoms or rest atoms induces a charge transfer onto the Si-H bond and a shift in energy of the remaining dangling-bond states. Adsorption on the corner hole, however, does not involve any charge transfer. The relationship between charge transfer and binding energies is discussed.

  • Received 12 May 1995

DOI:https://doi.org/10.1103/PhysRevB.52.17231

©1995 American Physical Society

Erratum

Erratum: Ab initio study of hydrogen adsorption on the Si(111)-(7×7) surface

H. Lim, K. Cho, I. Park, J. D. Joannopoulos, and Efthimios Kaxiras
Phys. Rev. B 54, 5179 (1996)

Authors & Affiliations

H. Lim, K. Cho, I. Park, and J. D. Joannopoulos

  • Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

Efthimios Kaxiras

  • Department of Physics and Division of Applied Sciences, Harvard University, Cambridge, Massachusetts 02138

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Issue

Vol. 52, Iss. 24 — 15 December 1995

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