Charge transfer, doping, and interface morphologies for Al-C60

D. W. Owens, C. M. Aldao, D. M. Poirier, and J. H. Weaver
Phys. Rev. B 51, 17068 – Published 15 June 1995
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Abstract

The electronic properties and morphologies of aluminum-C60 interfaces have been studied with photoelectron spectroscopy. The formation of an interface dipole between the first layer of C60 and Al establishes the Fermi level as the common energy-level reference. This dipole layer reflects the transfer of ∼0.2 electrons per first-layer fullerene. Deposition of Al onto C60 at 300 K results in the formation of Al clusters on the surface and also limited Al diffusion into the fullerene lattice. These interstitial Al atoms create a solid solution and form donor levels that are thermally ionized. Aluminum overlayer growth at 60 K results in smaller islands and suppressed doping because both surface and bulk diffusion are thermally activated processes. There is no evidence of bulk Al-C60 compound formation.

  • Received 9 February 1995

DOI:https://doi.org/10.1103/PhysRevB.51.17068

©1995 American Physical Society

Authors & Affiliations

D. W. Owens, C. M. Aldao, D. M. Poirier, and J. H. Weaver

  • Department of Materials Science and Chemical Engineering, University of Minnesota, Minneapolis, Minnesota 55455

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Vol. 51, Iss. 23 — 15 June 1995

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