Electron mobilities in modulation-doped AlxGa1xAs/GaAs and pseudomorphic AlxGa1xAs/InyGa1yAs quantum-well structures

Kaoru Inoue and Toshinobu Matsuno
Phys. Rev. B 47, 3771 – Published 15 February 1993
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Abstract

Electron mobilities in modulation-doped AlxGa1xAs/GaAs/AlxGa1xAs and pseudomorphic AlxGa1xAs/InyGa1yAs/AlxGa1xAs quantum-well structures with high electron concentration have been measured in order to clarify their dependences on the quantum-well thickness. It has been found that the 77-K mobilities show their highest values for quantum-well widths ranging from 80 to 100 Å. To understand the experimental results, mobility calculations were performed using a two-subband transport model. The experimental dependences of electron mobility on the quantum-well thickness were reproduced in the theoretical calculations and it has been found that the conditions for the highest mobilities at 77 K correspond to the case when the Fermi energies of electrons in the ground subband become maximum with almost all the electrons populating in the ground subband. For wider quantum-well thicknesses, electrons begin to populate in the upper subband, which results in sudden reduction in electron mobilities due to the sudden increase of intersubband scattering rate and reductions in Fermi energies of electrons in the ground subband.

  • Received 30 June 1992

DOI:https://doi.org/10.1103/PhysRevB.47.3771

©1993 American Physical Society

Authors & Affiliations

Kaoru Inoue and Toshinobu Matsuno

  • Semiconductor Research Center, Matsushita Electric Industrial Co. Ltd., 3-15, Yagumo-Nakamachi, Moriguchi, Osaka 570, Japan

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Vol. 47, Iss. 7 — 15 February 1993

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