Evidence of type-I band offsets in strained GaAs1xSbx/GaAs quantum wells from high-pressure photoluminescence

A. D. Prins, D. J. Dunstan, J. D. Lambkin, E. P. O’Reilly, A. R. Adams, R. Pritchard, W. S. Truscott, and K. E. Singer
Phys. Rev. B 47, 2191 – Published 15 January 1993
PDFExport Citation

Abstract

We have used high-pressure photoluminescence in a diamond-anvil cell to investigate the band offsets between strained GaAs1xSbx and unstrained GaAs for x=0.12. It has generally been expected that this system should display a strongly type-II band lineup, with holes confined in deep GaAs1xSbx wells and the lowest-energy electron states in GaAs. Our results on a multiple-quantum-well sample show that this is not the case. We measure the photoluminescence transition energies up to and beyond the Γ-X crossover near 36 kbar, where the luminescence becomes indirect. The character of the Γ-X crossover dependence on well width requires a type-I offset for the X minimum and suggests a type-I offset for the Γ minimum of the conduction band. This is in good agreement with theory when the strong band-gap bowing in the GaAs1xSbx alloy system is properly taken into account.

  • Received 22 May 1992

DOI:https://doi.org/10.1103/PhysRevB.47.2191

©1993 American Physical Society

Authors & Affiliations

A. D. Prins, D. J. Dunstan, J. D. Lambkin, E. P. O’Reilly, and A. R. Adams

  • Department of Physics, University of Surrey, Guildford GU2 5XH, United Kingdom

R. Pritchard, W. S. Truscott, and K. E. Singer

  • Department of Electrical Engineering and Electronics, University of Manchester Institute of Science and Technology, P.O. Box 88, Manchester M60 1QD, United Kingdom

References (Subscription Required)

Click to Expand
Issue

Vol. 47, Iss. 4 — 15 January 1993

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×