Optical studies of vertical ambipolar transport and interface recombination velocities in GaAs/Al0.5Ga0.5As double-quantum-well heterostructures

H. Hillmer, A. Forchel, T. Kuhn, G. Mahler, and H. P. Meier
Phys. Rev. B 43, 13992 – Published 15 June 1991
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Abstract

We present a detailed experimental and theoretical study of vertical ambipolar transport in semiconductor heterostructures. A high-resolution time-of-flight method using two vertically separated quantum wells of different well widths is applied to probe the carrier transport perpendicular to the heterointerfaces. By a numerical simulation the ambipolar diffusivities as well as surface and interface recombination velocities in GaAs/AlxGa1xAs structures are determined. This paper emphasizes the importance of surface and interface recombination for the analysis of the transport data. Alloy-disorder scattering is found to limit the ambipolar mobilities between 40 and 120 K in the Al0.5Ga0.5As barriers with acoustic-deformation-potential and polar-optical scattering participating above 120 K. In addition to the transport properties, we also obtain information on carrier capture from the barrier layers into the quantum well as a function of temperature.

  • Received 19 February 1991

DOI:https://doi.org/10.1103/PhysRevB.43.13992

©1991 American Physical Society

Authors & Affiliations

H. Hillmer and A. Forchel

  • 4. Physikalisches Institut, Universität Stuttgart, Pfaffenwaldring 57, D-7000 Stuttgart, Germany

T. Kuhn and G. Mahler

  • Institut für Theoretische Physik, Universität Stuttgart, Pfaffenwaldring 57, D-7000 Stuttgart, Germany

H. P. Meier

  • IBM Research Division, Forschungslabor Zürich, CH-8803 Rüschlikon, Switzerland

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Issue

Vol. 43, Iss. 17 — 15 June 1991

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