Magnetic-field dependence of the hole-hole interaction in fluorine-intercalated graphite fibers

S. L. di Vittorio, M. S. Dresselhaus, M. Endo, and T. Nakajima
Phys. Rev. B 43, 1313 – Published 15 January 1991
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Abstract

Magnetoresistance measurements have been performed in high magnetic fields up to 15 teslas in fluorine-intercalated vapor-deposited graphite fibers with concentrations C4.5F and C3.6F. Previous studies had shown that the intercalation of fluorine, an acceptor in graphite, induces a two-dimensional hole gas in the graphene layers. The fluorine-intercalation process also introduces disorder into the highly ordered pristine fiber, as exhibited by the transport properties. At high magnetic fields, a positive magnetoresistance is observed and is found to vary strongly with temperature. This phenomenon is explained by the effect of the magnetic field on the hole-hole interaction when the spin subbands are split by the magnetic field. A negative magnetoresistance is observed at low fields, and is explained in terms of weak-localization theory. The magnetoresistance data are fitted with the weak-localization contribution in the weak-field regime, then extrapolated to high fields and this contribution is finally subtracted from the measured values to obtain the hole-hole interaction contribution to the magnetoresistance. From a fit to this latter contribution, a value for the screening parameter is found. The relative importance of the weak localization and hole-hole interaction contributions to the logarithmic increase in ρ(T) at low temperature is discussed.

  • Received 29 June 1990

DOI:https://doi.org/10.1103/PhysRevB.43.1313

©1991 American Physical Society

Authors & Affiliations

S. L. di Vittorio

  • Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

M. S. Dresselhaus

  • Department of Electrical Engineering and Computer Science and Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

M. Endo

  • Department of Electrical Engineering, Faculty of Engineering, Shinshu University, Nagano 380, Japan

T. Nakajima

  • Division of Molecular Engineering, Graduate School of Engineering, Kyoto University, Sakyo-ku, Kyoto 606, Japan

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Vol. 43, Iss. 2 — 15 January 1991

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