Structural compromise of the arsenic-terminated silicon (111) surface

C. H. Patterson and R. P. Messmer
Phys. Rev. B 39, 1372 – Published 15 January 1989
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Abstract

The generalized-valence-bond method of electronic-structure calculation has been used to calculate equilibrium bond angles and bond lengths in a cluster representing the ideal Si(111)-(1×1)As surface. These are compared to equivalent parameters for the trisilylarsine molecule [(SiH3)3As]. This molecule is assumed to represent an ‘‘ideal’’ structure for the Si3As unit since the Si atoms are not constrained to specific lattice positions. Nearest-neighbor distances between Si atoms in a Si(111) plane are 0.4 Å greater than the distance found in trisilylarsine. The structure of the Si(111)-(1×1)As surface can then be regarded as resulting from a compromise between ‘‘ideal’’ Si-As bond lengths and bond angles, given the constraints of the (111) surface atomic positions.

  • Received 9 August 1988

DOI:https://doi.org/10.1103/PhysRevB.39.1372

©1989 American Physical Society

Authors & Affiliations

C. H. Patterson

  • Department of Physics, University of Pennsylvania, Philadelphia, Pennsylvania 19104-6396

R. P. Messmer

  • General Electric Company, Corporate Research and Development Center, P.O. Box 8, Schenectady, New York 12301
  • Department of Physics, University of Pennsylvania, Philadelphia, Pennsylvania 19104-6396

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Vol. 39, Iss. 2 — 15 January 1989

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