Microwave photoresistivity of a two-dimensional electron gas and the fractional quantum Hall effect

Y. Guldner, M. Voos, J. P. Vieren, J. P. Hirtz, and M. Heiblum
Phys. Rev. B 36, 1266 – Published 15 July 1987
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Abstract

We describe experimental results obtained from microwave photoresistivity measurements in a low-electron-density modulation-doped GaAs-AlxGa1xAs heterojunction. We believe that such sensitive experiments can provide interesting information on the fractional quantum Hall effect.

  • Received 12 January 1987

DOI:https://doi.org/10.1103/PhysRevB.36.1266

©1987 American Physical Society

Authors & Affiliations

Y. Guldner, M. Voos, J. P. Vieren, and J. P. Hirtz

  • Groupe de Physique des Solides de l’Ecole Normale Supérieure, 24 rue Lhomond, 75005 Paris, France

M. Heiblum

  • IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598

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Vol. 36, Iss. 2 — 15 July 1987

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