Analysis of multiphoton ionization of metal atoms in the saturation regime using subpicosecond KrF laser pulses

B. Witzel, C. J. G. J. Uiterwaal, H. Schröder, D. Charalambidis, and K.-L. Kompa
Phys. Rev. A 58, 3836 – Published 1 November 1998; Erratum Phys. Rev. A 59, 3141 (1999)
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Abstract

Singly and multiply charged ion yield curves are reported for resonant and nonresonant two-photon-ionization processes for a collection of 31 metal atoms. The atoms are created by sputtering from a solid target using an Ar-ion gun. Single and multiple ionization of these atoms is performed using linearly polarized 248.6-nm (KrF) laser pulses with a full width at half maximum duration of 500 fs, employing intensities between 109 and 1012Wcm2. A four-grid high-resolution reflecting time-of-flight spectrometer is used for ion detection. This advanced spectrometer has a well-defined and small source volume, enabling absolute measurements of ionization probabilities and saturation intensities. Because our measurements are not affected by the increase of the interaction volume for increasing intensities, we can discriminate between resonant and nonresonant multiphoton ionization processes without varying the laser pulse duration. For many metals, the intensity dependence of the ion yield can be accurately reproduced by rate calculations based on a resonantly enhanced two-photon-ionization scheme. As a result, we can determine absolute values of the one-photon cross sections in the resonant processes and these are compared to theoretical values we calculated. For the nonresonant processes, we give generalized multiphoton-ionization cross sections and compare these to a scaling law of Lambropoulos [J. Opt. Soc. Am. B 4, 821 (1987)].

  • Received 24 March 1998

DOI:https://doi.org/10.1103/PhysRevA.58.3836

©1998 American Physical Society

Erratum

Erratum: Analysis of multiphoton ionization of metal atoms in the saturation regime using subpicosecond KrF laser pulses [Phys. Rev. A 58, 3836 (1998)]

B. Witzel, C. J. G. J. Uiterwaal, H. Schröder, D. Charalambidis, and K.-L. Kompa
Phys. Rev. A 59, 3141 (1999)

Authors & Affiliations

B. Witzel1,*, C. J. G. J. Uiterwaal1,†, H. Schröder1, D. Charalambidis2,3, and K.-L. Kompa1

  • 1Laser Chemistry Division, Max-Planck-Institut für Quantenoptik, P.O. Box 1513, D-85740 Garching, Federal Republic of Germany
  • 2Foundation for Research and Technology–Hellas, Institute of Electronic Structure & Laser, Laser and Applications Division, P.O. Box 1527, GR-711 10 Heraklion, Crete, Greece
  • 3Physics Department, University of Crete, Heraklion, Crete, Greece

  • *Author to whom correspondence should be addressed. Electronic address: KEU@MPQ.MPG.DE
  • Electronic address: WITZEL@LUCE.IESL.FORTH.GR

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Vol. 58, Iss. 5 — November 1998

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